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Titanium Plate Sputtering Targets High Purity For Semiconductor Chips

    Buy cheap Titanium Plate Sputtering Targets High Purity For Semiconductor Chips from wholesalers
     
    Buy cheap Titanium Plate Sputtering Targets High Purity For Semiconductor Chips from wholesalers
    • Buy cheap Titanium Plate Sputtering Targets High Purity For Semiconductor Chips from wholesalers
    • Buy cheap Titanium Plate Sputtering Targets High Purity For Semiconductor Chips from wholesalers

    Titanium Plate Sputtering Targets High Purity For Semiconductor Chips

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    Brand Name : JINXING
    Model Number : Titanium Sputtering Target
    Certification : ISO 9001
    Price : 20~200USD/kg
    Payment Terms : L/C, D/A, D/P, T/T, Western Union
    Supply Ability : 100000kgs/M
    Delivery Time : 10~25 work days
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    Titanium Plate Sputtering Targets High Purity For Semiconductor Chips

    Titanium Plate Sputtering Target high purity 99.99%, 99.999%

    High purity material, ultra-high purity material, semiconductor high purity material


    Products include low oxygen ultra-high purity titanium material, high-end titanium alloy material, production equipment and process development of low oxygen ultra-fine (spherical) Ti powder and Ti alloy powder, advanced metal pressure processing technology, process development of low-cost Ti, near net forming processing technology (additive manufacturing, precision casting). It is widely used in the purification and preparation of ultra-high purity metal materials for semiconductors, the preparation and processing of high-end titanium alloys for aviation, offshore oil, green energy, medical devices and other fields.


    Titanium is widely used in various fields of modern industry because of its superior comprehensive properties. However, titanium with ordinary purity is far from meeting the most advanced technical requirements in the core strategic fields such as semiconductor integrated circuit, aerospace, military industry, medical treatment, petrochemical industry, etc. From 99.98% to 99.999%, although there is only a little bit in the number, it has made a qualitative leap. Only ultra-high pure titanium can meet the raw material requirements of many modern industries and advanced processing technologies, such as sputtering target materials for semiconductor chips, high-end titanium alloy for aerospace, high-end titanium powder for 3D printing, etc



    Titanium Plate Sputtering Target 99.99% , Titanium Plate Sputtering Target 99.999% are available in varying sizes


    Product NameElementPurirtyMelting Point Density (g/cc)Available Shapes
    High Pure SliverAg4N-5N96110.49Wire, Sheet, Particle, Target
    High Pure AluminumAl4N-6N6602.7Wire, Sheet, Particle, Target
    High Pure GoldAu4N-5N106219.32Wire, Sheet, Particle, Target
    High Pure BismuthBi5N-6N271.49.79Particle, Target
    High Pure CadmiumCd5N-7N321.18.65Particle, Target
    High Pure CobaltCo4N14958.9Particle, Target
    High Pure ChromiumCr3N-4N18907.2Particle, Target
    High Pure CopperCu3N-6N10838.92Wire, Sheet, Particle, Target
    High Pure FerroFe3N-4N15357.86Particle, Target
    High Pure GermaniumGe5N-6N9375.35Particle, Target
    High Pure IndiumIn5N-6N1577.3Particle, Target
    High Pure MagnesiumMg4N6511.74Wire, Particle, Target
    High Pure MagnesiumMn3N12447.2Wire, Particle, Target
    High Pure MolybdenumMo4N261710.22Wire, Sheet, Particle, Target
    High Pure NiobiumNb4N24688.55Wire, Target
    High Pure NickelNi3N-5N14538.9Wire, Sheet, Particle, Target
    High Pure LeadPb4N-6N32811.34Particle, Target
    High Pure PalladiumPd3N-4N155512.02Wire, Sheet, Particle, Target
    High Pure PlatinumPt3N-4N177421.5Wire, Sheet, Particle, Target
    High Pure SiliconSi5N-7N14102.42Particle, Target
    High Pure TinSn5N-6N2327.75Wire, Particle, Target
    High Pure TantalumTa4N299616.6Wire, Sheet, Particle, Target
    High Pure TelluriumTe4N-6N4256.25Particle, Target
    High Pure TitaniumTi4N-5N16754.5Wire, Particle, Target
    High Pure TungstenW3N5-4N341019.3Wire, Sheet, Particle, Target
    High Pure ZincZn4N-6N4197.14Wire, Sheet, Particle, Target
    High Pure ZirconiumZr4N14776.4Wire, Sheet, Particle, Target


    Application field of sputtering coating: Sputtering coating is widely used in packaging coating, decoration coating, architectural glass coating, automobile glass coating, low radiation glass coating, flat panel display, optical communication / optical industry, optical data storage industry, optical data storage industry, magnetic data storage industry, optical coating, semiconductor field, automation, solar energy, medical treatment, self lubrication film, capacitor Device coating, other functional coating, etc. (click to enter the detailed introduction)


    Sputtering target backplane supply, bonding service: the center provides a variety of sputtering target backplane, including oxygen-free copper, molybdenum, aluminum, stainless steel and other materials. At the same time, it provides the welding service between the target and the back plate.

    Titanium Plate Sputtering Targets High Purity For Semiconductor Chips

    Quality Titanium Plate Sputtering Targets High Purity For Semiconductor Chips for sale
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