Copper Rotatable Sputtering Target High Density With Smooth Surface

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JINXING MATECH CO LTD

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Copper Rotatable Sputtering Target High Density With Smooth Surface

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Copper Rotatable Sputtering Target High Density With Smooth Surface

Copper Rotatable Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode ...

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Copper Rotatable Sputtering Target

Sputtering Target With Smooth Surface

Copper Sputtering Target High Density

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